EXCIMER LASER 193nm DEEP ULTRA VIOLET UV ArF Maximum single pulse energy 400mJ
Datasheet for 193nm EXCIMER LASER ArF
Features:
Pulse energy up to 400mJ
Adopt magnetic booster excitation circuit design to extend the life of thyratron
Built-in energy feedback system, good energy stability
Internal trigger/External trigger
Support dual wavelength customization
Technical Parameters:
Medium Gas:ArF
Wavelength (nm):193nm Deep Ultra Violet UV Laser
Maximum single pulse energy (mJ):400mJ
Maximum average power (W):15W
Maximum repetition frequency (Hz):50
Pulse Width (FWHM, ns): 25-30
Spot Size (mm)(V*H): (26+1) x (9+1)
Energy Stability (sigma,%) - 0.75 (248nm measured at output)
Divergence angle:~3×1
Cooling method - Cold
Interactive Method - Control system; RS232 (LCD screen/PC) / External Trigger: Electric Signal
Applications:
Laser deposited thin films/Fine processing/Material surface treatment/Laser annealing
